Analysis of amorphous indium-gallium-zinc-oxide thin-film transistor contact metal

Abstract

It is widely reported that threshold voltage and on-state current of amorphous indiumgallium- zinc-oxide bottom-gate thin-film transistors is strongly influenced by the choice of source/drain contact metal. Electrical characterisation of thin-film transistors indicates that the electrical properties depend on the type and thickness of the metal(s) used. Electron transport mechanisms and possibilities for control of the defect state density are discussed. Pilling-Bedworth theory for metal oxidation explains the interaction between contact metal and amorphous indium-gallium-zinc-oxide, which leads to significant trap formation. Charge trapping within these states leads to variable capacitance diode-like behavior and is shown to explain the thin-film transistor operation.